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1

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - ArF immersion lithography using TWINSCAN technology

Mulkens, Jan, Streefkerk, Bob, Hoogendorp, Martin, Wang, Yangyuan, Yao, Jun-en, Progler, Christopher J.

Year:

2005

Language:

english

File:

PDF, 720 KB

english, 2005

2

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - Imaging simulation of maskless lithography using a DMD

Liu, Chi, Guo, Xiaowei, Gao, Fuhua, Luo, Boliang, Duan, Xi, Du, Jinglei, Qiu, Chuankai, Wang, Yangyuan, Yao, Jun-en, Progler, Christopher J.

Year:

2005

Language:

english

File:

PDF, 348 KB

english, 2005

3

Special Issue: Participatory Discrepancies || Searching for Swing: Participatory Discrepancies in the Jazz Rhythm Section

Journal:

Ethnomusicology

Year:

1995

Language:

english

File:

PDF, 1.03 MB

english, 1995

4

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - 157-nm Twyman-Green interferometer for lens testing

Statt, Bryan D., Dewa, Paul G., Mack, Stephen K., Schreiber, Horst, Stone, Bryan D., Tompkins, Paul J., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 280 KB

english, 2001

5

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Introduction of new techniques for matching overlay enhancement

Kikuchi, Takahisa, Ishii, Yuuki, Tokuda, Noriaki, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 137 KB

english, 2001

6

Design-Aware Mask Inspection

Kagalwalla, A.A., Gupta, P., Progler, C.J., McDonald, S.

Journal:

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems

Year:

2012

Language:

english

File:

PDF, 2.02 MB

english, 2012

7

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Forbidden pitches for 130-nm lithography and below

Socha, Robert J., Dusa, Mircea V., Capodieci, Luigi, Finders, Jo, Chen, J. Fung, Flagello, Donis G., Cummings, Kevin D., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 1.26 MB

english, 2000

8

Nanoimprinting Techniques for Large-Area Three-Dimensional Negative Index Metamaterials with Operation in the Visible and Telecom Bands

Gao, Li, Shigeta, Kazuki, Vazquez-Guardado, Abraham, Progler, Christopher J., Bogart, Gregory R., Rogers, John A., Chanda, Debashis

Journal:

Year:

2014

Language:

english

File:

PDF, 7.57 MB

english, 2014

9

Polarization and Hyper-NA Lithography

Progler, Christopher J.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2005

Language:

english

File:

PDF, 28 KB

english, 2005

10

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - Soft nanoimprint lithography

Chen, Y., Roy, E., Kanamori, Y., Belotti, M., Decanini, D., Wang, Yangyuan, Yao, Jun-en, Progler, Christopher J.

Year:

2005

Language:

english

File:

PDF, 181 KB

english, 2005

11

[IEEE 2014 Saudi Arabia Smart Grid (SASG) - Jeddah, Saudi Arabia (2014.12.14-2014.12.17)] 2014 Saudi Arabia Smart Grid Conference (SASG) - From energy storage to EnerNet: Smart grid for abundant energy

Boksha, Victor V., Foster, Richard O., Ignatiev, Alex N., Chow, Clara, Ryjov, Alexander P., Bulai, Pavel M., Progler, Chris, Hague, Edward, Wong, Ann Chai

Year:

2014

Language:

english

File:

PDF, 18.10 MB

english, 2014

12

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Rigorous electromagnetic simulation applied to alignment systems

Deng, Yunfei, Pistor, Thomas V., Neureuther, Andrew R., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 222 KB

english, 2001

13

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Rigorous diffraction analysis for future mask technology

Erdmann, Andreas, Friedrich, Christoph M., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 1.17 MB

english, 2000

14

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Implementation of an automated feedback focus control methodology for Nikon (NSR) i-line and DUV steppers and scanners

Lalovic, Ivan, Parry, Joseph T., Gwynn, Brett, Silsby, Christopher D., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 896 KB

english, 2000

15

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Advanced technology for extending optical lithography

Wagner, Christian, Kaiser, Winfried M., Mulkens, Jan, Flagello, Donis G., Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 2.32 MB

english, 2000

16

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication

Ruede, David, Ercken, Monique, Borgers, Tom, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 658 KB

english, 2001

17

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - 193 lithography and RELACS processing for BEOL lithography

DellaGuardia, Ronald, Petrillo, Karen E., Chen, Jia, Rabidoux, Paul, Dalton, Timothy J., Holmes, Steven J., Hadel, Linda M., Malone, K., Mahorowala, Arpan P., Greco, S., Ferguson, Richard A., Progler,

Year:

2001

Language:

english

File:

PDF, 1.34 MB

english, 2001

18

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Variable-threshold optical proximity correction (OPC) models for high-performance 0.18-μm process

Liao, Hongmei, Palmer, Shane R., Sadra, Kayvan, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 1.78 MB

english, 2000

19

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Design and Process Integration for Microelectronic Manufacturing III - Mask cost analysis via write time estimation

Zhang, Yuan, Liebmann, Lars W., Gray, Rick, Chou, Seurien, Rockwell, Barry, Xiao, Guangming, Kamberian, Henry, Cottle, Rand, Wolleben, Alex, Progler, Chris

Year:

2005

Language:

english

File:

PDF, 57 KB

english, 2005

20

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Optimization for full-chip process of 130-nm technology with 248-nm DUV lithography

Ham, Young-Mog, Kim, Seok-Kyun, Kim, Sang-Jin, Hur, Cheol, Kim, YoungSik, Baik, Ki-Ho, Kim, Bong-Ho, Ahn, Dong-Jun, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 1.20 MB

english, 2000

21

Der 59. Deutsche Juristentag in Hannover 1992

Ulrike Wolf, Thomas von Danwitz, Helmut Seitz, Ulrich Preis, Wolfgang Prögler and Volker Butzke

Journal:

JuristenZeitung

Year:

1993

Language:

german

File:

PDF, 1.84 MB

german, 1993

22

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Study of obscuration in catadioptric lenses

McCallum, Martin, Smith, Bruce W., Bassett, Steve, Cashmore, Julian S., Webb, James E., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 550 KB

english, 2001

23

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Evaluation of 3D alternating PSM structures using mask topography simulation, and AIMS at λ=193nm

Tabery, Cyrus E., Spence, Chris A., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 484 KB

english, 2001

24

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - New phase-shift gratings for measuring aberrations

Nomura, Hiroshi, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 926 KB

english, 2001

25

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Carbon antireflective coating (ARC) technology for both KrF and ArF lithography

Kim, Yongbeom, Lee, Junghyun, Cho, Hanku, Moon, Joo-Tae, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 465 KB

english, 2001

26

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Protecting 248-nm and 193-ηm lithography from airborne molecular contamination during semiconductor fabrication

Grayfer, Anatoly, Kishkovich, Oleg P., Ruede, David, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 283 KB

english, 2001

27

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Impact of flare on CD variation for 248-nm and 193-nm lithography systems

Bourov, Anatoly, Litt, Lloyd C., Zavyalova, Lena, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 276 KB

english, 2001

28

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - Photomask development for 90-nm technology

Zhang, Yuan, Wang, Yangyuan, Yao, Jun-en, Cottle, Rand, Mackay, Scott, Progler, Christopher J., Xiao, Guangming, Unruh, James, Progler, Christopher J.

Year:

2004

Language:

english

File:

PDF, 141 KB

english, 2004

29

Special Section Guest Editorial: Photomasks for EUV Lithography

Progler, Christopher, Abboud, Frank

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 530 KB

english, 2013

30

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Overlay performance in advanced processes

Bornebroek, Frank, Burghoorn, Jaap, Greeneich, James S., Megens, Henry J. L., Satriasaputra, Danu, Simons, Geert, Stalnaker, Sunny, Koek, Bert, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 465 KB

english, 2000

31

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Scattered light: the increasing problem for 193-nm exposure tools and beyond

Lai, Kafai, Wu, ChungHsi J., Progler, Christopher J., Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 324 KB

english, 2001

32

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Exposure latitude analysis for dense line and space patterns by using diffused aerial image model

Ahn, Chang-Nam, Progler, Christopher J., Kim, Hee-Bom, Baik, Ki-Ho

Year:

2000

Language:

english

File:

PDF, 387 KB

english, 2000

33

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - 157-nm lithography simulation using a finite-difference time-domain method with oblique incidence in a multilayered medium

Yeung, Michael S., Progler, Christopher J., Barouch, Eytan, Martin, Clifford A., McClay, James A.

Year:

2000

Language:

english

File:

PDF, 1.40 MB

english, 2000

34

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Aberration control for advanced step-and-scan systems using pupil plane engineering

Sewell, Harry, Progler, Christopher J., Cote, Daniel R., Guzman, Andrew, Lafiandra, Carlo, O'Neil, Tim

Year:

2001

Language:

english

File:

PDF, 16.02 MB

english, 2001

35

[IEEE 2019 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2019.3.18-2019.3.19)] 2019 China Semiconductor Technology International Conference (CSTIC) - Effective Mask Patterning Strategy as Design Complexity and CD Stability

Ham, Young, Choi, Yohan, Green, Michael, Ramadan, Mohamed, Progler, Chris

Year:

2019

Language:

english

File:

PDF, 990 KB

english, 2019

36

Das Brennesselsamenöl

Dr.-Ing. R. Prögler

Journal:

European Journal of Lipid Science and Technology

Year:

1941

Language:

german

File:

PDF, 272 KB

german, 1941

37

Understanding high numerical aperture optical lithography

D.G. Flagello, A.E. Rosenbluth, C. Progler, J. Armitage

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 319 KB

english, 1992

38

Line end shortening in CPL mask technology

Will Conley, Jan Pieter Kuijten, Arjan Verhappen, Stefan van de Goor, Lloyd Litt, Wei Wu, Kevin Lucas, Bernie Roman, Bryan Kasprowicz, Chris Progler, Robert Socha, Doug van den Broeke, Kurt Wampler, T

Journal:

Microelectronic Engineering

Year:

2005

Language:

english

File:

PDF, 259 KB

english, 2005

39

Illuminator design for the printing of regular contact patterns

Martin Burkhardt, Anthony Yen, Christopher Progler, Greg Wells

Journal:

Microelectronic Engineering

Year:

1998

Language:

english

File:

PDF, 362 KB

english, 1998

40

Emerging wireless broadband networks

Mikkonen, J., Corrado, C., Evci, C., Progler, M.

Journal:

IEEE Communications Magazine

Year:

1998

Language:

english

File:

PDF, 1.84 MB

english, 1998

41

Air interface access schemes for broadband mobile systems

Progler, M., Evci, C., Umehira, M.

Journal:

IEEE Communications Magazine

Year:

1999

Language:

english

File:

PDF, 1.38 MB

english, 1999

42

Biochemical changes in the mother and the fetus during labor and its significance for the management of the second stage

H. Schneider, M. Prögler, W.H. Ziegler, R. Huch

Journal:

International Journal of Gynecology & Obstetrics

Year:

1990

Language:

english

File:

PDF, 951 KB

english, 1990

43

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography

Yune, Hyoung-Soon, Kim, Hee-Bom, Kim, Wan-Ho, Ahn, Chang-Nam, Ham, Young-Mog, Shin, Ki-Soo, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 909 KB

english, 2001

44

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Dynamic change of transmission of CaF2 single crystals by irradiating with ArF excimer laser light

Alkemper, Jochen, Kandler, Joerg, Strenge, Lorenz, Moersen, Ewald, Muehlig, Christian, Triebel, Wolfgang, Progler, Christopher J.

Year:

2000

Language:

english

File:

PDF, 771 KB

english, 2000

45

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - ArF step-and-scan system with 0.75 NA for the 0.10μm node

Vleeming, Bert, Heskamp, Barbra, Bakker, Hans, Verstappen, Leon, Finders, Jo, Stoeten, Jan, Boerret, Rainer, Roempp, Oliver, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 1.97 MB

english, 2001

46

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Method to budget and optimize total device overlay

Progler, Christopher J., Bukofsky, Scott J., Wheeler, Donald C., Van den Hove, Luc

Year:

1999

Language:

english

File:

PDF, 2.21 MB

english, 1999

47

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Aerial image measurement methods for fast aberration set-up and illumination pupil verification

van der Laan, Hans, Dierichs, Marcel, van Greevenbroek, Henk, McCoo, Elaine, Stoffels, Fred, Pongers, Richard, Willekers, Rob, Progler, Christopher J.

Year:

2001

Language:

english

File:

PDF, 576 KB

english, 2001

48

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - EUV/soft x-ray multilayer optics

Yulin, Sergiy A., Feigl, Torsten, Benoit, Nicolas, Kaiser, Norbert, Wang, Yangyuan, Yao, Jun-en, Progler, Christopher J.

Year:

2005

Language:

english

File:

PDF, 630 KB

english, 2005

49

SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] Advanced Microlithography Technologies - Exposure dose control for step-and-scan lithography

Guo, Liping, Huang, Huijie, Wang, Xiangzhao, Zhang, Dongqing, Wang, Yangyuan, Yao, Jun-en, Progler, Christopher J.

Year:

2005

Language:

english

File:

PDF, 197 KB

english, 2005

50

Negative Index Materials: Materials Selections and Growth Conditions for Large-Area, Multilayered, Visible Negative Index Metamaterials Formed by Nanotransfer Printing (Advanced Optical Materials 3/2014)

Gao, Li, Kim, Youngmin, Vazquez-Guardado, Abraham, Shigeta, Kazuki, Hartanto, Steven, Franklin, Daniel, Progler, Christopher J., Bogart, Gregory R., Rogers, John A., Chanda, Debashis

Journal:

Advanced Optical Materials

Year:

2014

File:

PDF, 4.84 MB

2014

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